Chinese researchers make EUV breakthrough
a year ago
- #EUV
- #Photolithography
- #China
- Former ASML head scientist Lin Nan leads China's EUV breakthrough.
- Research team from Chinese Academy of Sciences achieves world-class photolithography results with solid-state laser-driven approach.
- ASML CEO Christophe Fouquet doubts China's ability to make an EUV machine quickly.
- Lin Nan returned to China in 2021 as part of a high-level recruitment drive.
- Lin Nan founded the advanced photolithography technology research group responsible for the breakthrough.
- Before ASML, Lin was mentored by Nobel Prize winner Anne L’Huillier under an EU scholarship.