- Intel has successfully achieved dual-qualification for Panther Lake chips using High-NA EUV lithography.
- High-NA EUV uses a 0.55 numerical aperture to print features 60% smaller than standard EUV in a single exposure.
- This eliminates the need for multi-patterning, reducing manufacturing time, defects, and costs.
- Wafers processed on ASML's $400 million Twinscan EXE High-NA machine have yields matching Intel's mature platforms.
- The milestone proves High-NA is commercially viable, marking a major victory for ASML despite industry skepticism.